175% Modeling for Product-Line Evolution of Domain Artifacts

Lity, Sascha; Nahrendorf, Sophia; Th\; Seidl, Christoph; Schaefer, Ina

doi:10.1145/3168365.3168369

by Lity, Sascha, Nahrendorf, Sophia, Thüm, Thomas, Seidl, Christoph and Schaefer, Ina

Reference:

175% Modeling for Product-Line Evolution of Domain Artifacts (Lity, Sascha, Nahrendorf, Sophia, Thüm, Thomas, Seidl, Christoph and Schaefer, Ina), In Proceedings of the 12th International Workshop on Variability Modelling of Software-Intensive Systems, ACM, 2018.

Bibtex Entry:

@InProceedings{Lity2018,
  Title                    = {{175{\%} Modeling for Product-Line Evolution of Domain Artifacts}},
  Author                   = {Lity, Sascha and Nahrendorf, Sophia and Th\"{u}m, Thomas and Seidl, Christoph and Schaefer, Ina},
  Booktitle                = {Proceedings of the 12th International Workshop on Variability Modelling of Software-Intensive Systems},
  Year                     = {2018},

  Address                  = {New York, NY, USA},
  Pages                    = {27--34},
  Publisher                = {ACM},
  Series                   = {VAMOS 2018},

  Acmid                    = {3168369},
  Doi                      = {10.1145/3168365.3168369},
  ISBN                     = {978-1-4503-5398-4},
  Keywords                 = {Software Evolution, Software Product Lines, Variability Modeling},
  Location                 = {Madrid, Spain},
  Numpages                 = {8},
  Owner                    = {Lity},
  Timestamp                = {2018.02.14},
  Url                      = {http://doi.acm.org/10.1145/3168365.3168369}
}